femtosecond laser ablation of silicon–modification thresholds and morphology

Femtosecond laser materials processing of a-Si:H below the ...- femtosecond laser ablation of silicon–modification thresholds and morphology ,ABSTRACT Laser processing of thin-film silicon is a promising approach for the realization of polycrystalline silicon for large area electronics and solar cell applications. In this study we investigate the material modification of amorphous hydrogenated silicon (a-Si:H) with different hydrogen content (30%, 13% and Volume Table of Contents - spiedigitallibraryVolume gratings and welding of glass/plastic by femtosecond laser direct writing Wataru Watanabe Proc. SPIE 10456, Nanophotonics Australasia 2017, 104562L (2 January 2018); doi: 10.1117/12.2282889



Search results for: Masaki Hashida - infona.pl

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Mean value of the spikes diameter for different femtosecond ...

The ablation threshold of the silicon surface in the air was... | Circularity, Laser and Femtosecond Lasers | ResearchGate, the professional network for scientists.

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Micromachines | Free Full-Text | Femtosecond Laser Processing ...

The processed products had an average reflectivity of 2.06% in the range of 300 to 2500 nm and 4.3% in the range of 2.5 to 10 μm, and it was confirmed that the surface roughness and reflectivity of silicon obtained by laser cleaning assisted femtosecond laser ablation were lower than those obtained by hydrofluoric acid etching assisted ...

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Femtosecond laser modification of silicon ... - ScienceDirect

Laser ablation begins to occur when the laser fluence is 0.33 J/cm 2 and no periodic rippled structures occur on the SiC surface in the single pulse laser irradiation. The greater the number of pulses, the smaller the energy required to generate the periodic structure.

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Femtosecond Laser Ablation - an overview | ScienceDirect Topics

Femtosecond laser ablation is obviously an effective technique to functionalize surfaces but should be carefully considered because a profound knowledge of the phenomena involved is required to understand and apply the femtosecond laser functionalization. Indeed, while the setup used for femtosecond laser ablation might be described as simple in comparison to other patterning techniques, the phenomena involved in this technique are really complex and related to multiple parameters.

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Modification of dental enamel, dentin by an ultra-fast ...

Femtosecond laser treatments with fluences of 14 J/cm 2, which is almost 3 times the threshold fluence for enamel, may exceed the pulpal safety thermal threshold of 5.5 °C, if no external cooling is used , or surface scanning speeds are very low, which causes overlapping of sequential pulses. On the other hand, the use of faster scanning ...

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Micromachines | Free Full-Text | Femtosecond Laser Processing ...

The processed products had an average reflectivity of 2.06% in the range of 300 to 2500 nm and 4.3% in the range of 2.5 to 10 μm, and it was confirmed that the surface roughness and reflectivity of silicon obtained by laser cleaning assisted femtosecond laser ablation were lower than those obtained by hydrofluoric acid etching assisted ...

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Effects of parameters in femtosecond laser ... - SpringerLink

A series of ablation experiments on silicon surface by femtosecond laser system of 775 nm and 150 fs duration pulses were carried out. The morphological characteristics and the associated effect in the ablation were tested by atomic force microscope (AFM), scanning electron microscope (SEM), focused ion beam (FIB), and the optic microscope. The single pulse threshold can be obtained directly ...

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Conical microspike morphology formation and control on ...

Conical microspike morphology formation and control on various metal surfaces using femtosecond laser pulse ... laser ablation of silicon-modification thresholds and ...

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Polarization dependent femtosecond laser modification of MBE ...

We report a novel, polarization dependent, femtosecond laser-induced modification of surface nanostructures of indium, gallium, and arsenic grown on silicon via molecular beam epitaxy, yielding shape control from linear and circular polarization of laser excitation. Linear polarization causes an elongation effect, beyond the dimensions of the unexposed nanostructures, ranging from 88 nm to ...

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Femtosecond laser processing of crystalline silicon

and ablation of crystalline silicon wafers irradiated by infra-red 775 nm Ti:sapphire femtosecond laser. The effects of energy fluences (below and above single-pulse modification) with different number of pulses were studied. New morphological features such as pits, cracks formation, Laser-Induced Periodic Surface Structures (LIPSS) and ablation

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Simulation of femtosecond laser ablation of silicon

Femtosecond laser ablation is an important process in the micromachining and nanomachining of microelectronic, optoelectronic, biophotonic and MEMS components. The process of laser ablation of silicon is being studied on an atomic level using molecular dynamics (MD) simulations. We investigate ablation thresholds for Gaussian laser pulses of 800 nm wavelength, in the range of a few hundred ...

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Mean value of the spikes diameter for different femtosecond ...

The ablation threshold of the silicon surface in the air was... | Circularity, Laser and Femtosecond Lasers | ResearchGate, the professional network for scientists.

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Search results for: Masaki Hashida - infona.pl

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Femtosecond laser-induced damage morphologies of crystalline ...

The effect of sub-threshold pulses of circularly polarized Ti:sapphire femtosecond laser system on crystalline (1 0 0) silicon wafer was investigated.Surface damage morphologies were studied by irradiating the test silicon surface with pulses (peak fluence of 0.25 J/cm 2) in succession.

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Mean value of the spikes diameter for different femtosecond ...

The ablation threshold of the silicon surface in the air was... | Circularity, Laser and Femtosecond Lasers | ResearchGate, the professional network for scientists.

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Dependence of ablation rate on laser fluence in air and ...

Download scientific diagram | Dependence of ablation rate on laser fluence in air and vacuum (N = 200 pulses) from publication: Effects of pulse durations and environments on femtosecond laser ...

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Femtosecond laser ablation of silicon-modification thresholds ...

Femtosecond laser ablation of silicon-modification thresholds and morphology. We investigated the initial modification and ablation of crystalline silicon with single and multiple Ti:sapphire laser pulses of 5 to 400 fs duration. In accordance with earlier established models, we found the phenomena amorphization, melting, re-crystallization, nucleated vaporization, and ablation to occur with increasing laser fluence down to the shortest pulse durations.

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Laser processing at solid-liquid interfaces using femtosecond ...

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Lasers - scitation

This option allows users to search by Publication, Volume and Page Selecting this option will search the current publication in context. Book Search tips Selecting this option will search all publications across the Scitation platform Selecting this option will search all publications for the Publisher/Society in context

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Femtosecond-Laser-Ablation Dynamics in Silicon Revealed by ...

The dynamics of ablation in monocrystalline silicon, from electron-hole plasma generation to material expansion, upon irradiation by a single femtosecond laser pulse (1030 nm, 300 fs pulse duration) at a wide range of fluences is investigated using a time-resolved microscopy technique. The reflectivity evolution obtained from dynamic images in combination with a theoretical Drude model and a ...

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Single- and multishot femtosecond laser ablation of silicon ...

Femtosecond laser ablation allows to fabricate such unique structures and nanoparticles, although in order to develop an effective and precise technique of the surface modification and particles formation of the needed morphology, one should understand profoundly the main mechanisms of their emerging and learn to distinguish the main factors ...

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[PDF] Laser ablation of silicon induced by a femtosecond ...

We investigate laser ablation of crystalline silicon induced by a femtosecond optical vortex beam, addressing how beam properties can be obtained by analyzing the ablation crater. The morphology of the surface structures formed in the annular crater surface allows direct visualization of the beam polarization, while analysis of the crater size provides beam spot parameters.

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Micromachines | Free Full-Text | Femtosecond Laser Processing ...

The processed products had an average reflectivity of 2.06% in the range of 300 to 2500 nm and 4.3% in the range of 2.5 to 10 μm, and it was confirmed that the surface roughness and reflectivity of silicon obtained by laser cleaning assisted femtosecond laser ablation were lower than those obtained by hydrofluoric acid etching assisted ...

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