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of 735 Torr in a cold wall furnace (Easy Tube 3000, First Nano, Ronkonkoma, NY) equipped with a radiative heat source set to its maximum power (22 kW). The resulting dewetted Pt layer then served as a mask during anisotropic RIE of the SiO2 and Si [21,31,32]. The RIE was carried out in an Oxford PlasmaLab system (Oxford Instruments, UK)